| 摘要 |
<p>PURPOSE:To reduce attachment of dust of a mask and defects of the mask, and to enhance yield of mask preparation, labor saving and manufacturing efficiency, by conveying the mask mechanically and automatically between respective processing sections. CONSTITUTION:A photomask preparation device is composed, as a whole, of a pretreatment device 1 and a posttreatment device 2, and the mask is conveyed from the left to the right to process it in each section. The device 1 is provided with a scrubber 3, a paper dryer 4, a coater 5, a baker 6, and a storage section 7, and the mask is automatically conveyed between respective sections. A mask plate is coated with a photoresist with the device 1, and it is exposed to a prescribed optical pattern with an exposing device, and then, it is developed with the device 2 to complete the mask. It is automatically conveyed between a developing and etching section 29 and a stripping section 31 and also between this section 31 and a washing section 32, and all the conveyances except the exposing process executed between the devices 1 and 2 are automatically operated.</p> |
