摘要 |
<p>New ergol-8-ene and ergoline derivatives The invention relates to new ergol-8-ene and ergoline derivatives of the general formula /I/ /I/ wherein stands for -CH=C= or -CH2-CH= group, R stands for hydrogen atom or methyl group, R1 stands for hydrogen or halogen atom, R2 stands for lower alkylsulfonyloxy group, phenylsulfonyloxy group optionally substituted with a lower alkyl group, or azido group, R3 stands for lower alkylsulfonyl group or phenylsulfonyl group optionally substituted with a lower alkyl group, and acid addition salts thereof. These compounds can be prepared from compounds of the general formula /II/ /II/ wherein and R are as defined above, by reacting at least two equivalents of a lower alkylsulfonic acid chloride or phenylsulfonic acid chloride substituted with lower alkyl group. The resulting compound can be reacted with an alkali metal azide, and, if desired, the compound obtained is treated with a halogenating agent to form the 2-halogenide derivative, and, if desired, any resulting compound or general formula I is treated with an acid to form a therapeutically acceptable acid addition salt, or the free base is liberated from a salt. The compounds of general formula I possess valuable antiserotonine, antidepressant, dopamine receptor stimulant and hypotensive effects.</p> |
申请人 |
RICHTER GEDEON VEGYESZETI GYAR R.T. |
发明人 |
MAGO, ERZSEBET, NEE KARACSONY;TOLDY, LAJOS;BORSI, JOZSEF;TARDOS, LASZLO;KIRALY, ILDIKO;RONAI, ANDRAS |