发明名称 SEMICONDUCTOR LASER
摘要 PURPOSE:To enable to completely enclose a current in an active layer formed in a groove by forming the groove on a semi-insulating substrate and disposing the active layer in the groove. CONSTITUTION:A V-shaped groove is formed on a semi-insulating InP substrate 10. A p type InP clad layer 11, an InGaAsP active layer 12 and an n type InP clad layer are sequentially grown in the groove. Then, a p type conductive regin 14 is formed on the back side of the substrate 10. Thereafter, an n type electrode 15 is provided at the layer 13 side, and a p type electrode 16 is provided at the substrate 10 side. When thus constructed, a current can be completely confined in the layer 12 formed in the groove, thereby eliminating the reactive current.
申请公布号 JPS58114478(A) 申请公布日期 1983.07.07
申请号 JP19810213984 申请日期 1981.12.26
申请人 FUJITSU KK 发明人 UMEO ITSUO
分类号 H01S5/00;H01S5/227 主分类号 H01S5/00
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