发明名称 DRY TYPE SURFACE TREATING DEVICE
摘要 PURPOSE:To provide a dry type surface treating device which can treat the surfaces of materials to be treated selectively without any mask by constructing a pair of parallel flat plate type electrodes which are disposed to face each other in such a way that conductive electrode bodies are embedded in the prescribed positions of insulating substrates and providing on-off switches which can be connected to electric power sources to the respective electrode bodies. CONSTITUTION:To remove the desired parts of a Cr layer 2 by using a titled treating device, the inside of a reacting chamber 8 is maintained in a reactive gaseous atmosphere of CCl4, etc. under prescribed reactive pressure; thereafter, the on-off switches corresponding to the conductive electrode bodies corresponding to the parts to be removed are closed. For example, to remove the part A shown in the figure, the switches 22 and 25 connecting to the conductive electrode bodies 12 and 15 corresponding to the part A are closed and the switches 21, 23 and 24, 26 connecting to the other conductive electrode bodies 11, 13 and 14, 16 are held open. As a result, plasma 9 is formed between the bodies 12 and 15, and only the part A of the layer 2 is removed without forming any mask layer.
申请公布号 JPS58110674(A) 申请公布日期 1983.07.01
申请号 JP19810211745 申请日期 1981.12.23
申请人 FUJITSU KK 发明人 KOBAYASHI KENICHI
分类号 C23F4/00;C23C14/04;C23C14/34;H01J37/32;H01L21/302;H01L21/3065 主分类号 C23F4/00
代理机构 代理人
主权项
地址