| 摘要 |
PURPOSE:To form a magnetic thin film providing magnetic anisotropy by a method wherein film formation is done by applying uniaxial stress to the in- plane direction of a substrate and the stress is removed after completing film formation. CONSTITUTION:One end 12a of a wafer 12 is held on a base 11 for setting, and a handle 14 provided at the head of a screw 13 screwed in the base 11 is operated to rotate the screw 13, and then, the other end 12b of the wafer 12 is pressed with a pressing metal fitting 15 provided at the tip section of the screw 13, and a film is formed on the surface of the wafer under this condition. After completing film formation, uniaxial stress is left in the film by loosening the screw 13. This controls an anisotropic magnetic field in accordance with the stress applied to the substrate, and a magnetic thin film providing magnetic anisotropy can be formed. |
