发明名称 BEAM IRRADIATION APPARATUS
摘要 PURPOSE:To effect a local heating with a predetermined strong energy applied for a short period of time, by housing in a vacuum casing a charged particle beam control system, an objective lens and an object to be irradiated, and simultaneously irradiating the object with charged particle and light beam through a screen plate and a light- transmitting plate. CONSTITUTION:When subjected to a high-temperature treatment with a strong energy of a beam having a diameter of several tens of mum, evaporation takes place on an object 4 being irradiated. A stainless steel screen plate 13 is disposed several cm above the object 4. The plate 13 is provided with an aperture 14 for transmitting an electron beam 1 and is further provided with an aperture for transmitting a laser beam 2 applied obliquely, and a light-transmitting plate 15 is provided in the aperture, thereby preventing the contamination of the electron beam control system and the laser beam objective lens. The light-transmitting plate 15 should be an optical glass plate having a thickness not larger than 1mm. or a light-transmitting film 17 set on rolls 16. The screen plate 10 is periodically changed, and heating is effected with a large energy applied for a short period of time while a large energy applied for a short period of time while preventing the heat transfer to an unnecessary part as much as possible. Thus, the constitution is effective in forming an indefectible crystal, low-resistance wiring layer and the like.
申请公布号 JPS58110042(A) 申请公布日期 1983.06.30
申请号 JP19810212264 申请日期 1981.12.24
申请人 FUJITSU KK 发明人 SAKURAI JIYUNJI;IWAI TAKASHI;KAWAMURA SEIICHIROU
分类号 H01L21/66;H01J37/30;H01J37/305;H01L21/027 主分类号 H01L21/66
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