| 摘要 |
PURPOSE:To prevent the coming off of a wafer by a method wherein, when performing a vapor-phase reaction or a heat treatment, a basket supporting the wafer is used and said wafer is supported in a vertical type reaction tube. CONSTITUTION:The basket 1 can be inserted in the reaction tube 2 from one end thereof. Reaction gas flows from the upper side to the lower side as shown in the diagram, and reacted to the wafer on the basket 1. The basket 1 consists of a plurality of rings 3 and three coupling rods 4, with which said rings 3 are coupled. These coupling rods 4 are aparted 90 degrees at two points, and the non-illustrated wafer can be attached to the rings 3 through the gap of 180 degrees provided at the remaining one point. The coming off of the wafer can be prevented by providing a small protrusion at the gap of 180 degrees on the rings 3. |
