| 摘要 |
PURPOSE:To obtain superior characteristics on the whole, by forming first, and second amorphous layers on a substrate to fabricate a photoconductive material, and using a material contg. silicon atoms, hydrogen atoms, and 30 atomic % carbon atoms for the second layer. CONSTITUTION:A photoconductive material 100 consists of a substrate 101, and an amorphous material layer 102 formed on the substrate 101 consisting of silicon atoms as a main element, and at least one of hydrogen and halogen atoms as a constituent element. The layer 102 consists of the first photoconductive layer 103 and the second layer 104 composed of silicon, carbon, and hydrogen as amorphous constituent elements, and carbon is contained up to 30 atomic % in the second layer 104, thus permitting the obtained photoconductive material to be enhanced in comprehensive characteristics of electrical, optical, and photoconductive properties, and repetition performance, durability, etc. |
