| 摘要 |
A heat reflecting pane is formed by vacuum deposition and subsequent oxidation of a layer of titanium on a glass substrate to form an inner anatase layer and an outer rutile layer. The evaporation of the titanium is commenced at a pressure above 1 x 10<-4> Torr, with an oxygen pressure of 1 x 10<-4> and is conducted at such a rate that the pressure is reduced to about 10<-5> Torr. Hence the first deposited portion of the layer is grown under conditions which in subsequent oxidation give an anatase structure, and the later deposited portion of the layer develops a rutile structure. Deposition of the titanium layer is continuous and the resulting anatase layer has a continuous density increase in the direction away from the substrate. A second layer of titanium may be deposited over the initial layer, under similar conditions, so that a second pair of anatase and rutile layers are formed on oxidation. The pane may also be subjected to thermal prestressing simultaneously with or subsequent to the oxidation heating. |
