发明名称 PHOTOSENSITIVE POLYMER
摘要 Novel photosensitive polymers having an intrinsic viscosity [ eta ] of not less than 0.10 dl/g, measured at 25 DEG C. in N,N-dimethylformamide, and consisting of 1 to 40 mol % of recurring structural elements of the formula I <IMAGE> (I) and 60 to 99 mol % of recurring structural elements of the formula II <IMAGE> (II) in which R, R', R'', X, Z and Z1 are as defined in patent claim 1, are described. The polymers according to the invention can be partially complexed with metal ions of a metal of group VIII or Ib of the periodic table. In not less than 20% of the structural elements of the formula II, Z1 is -COO-C2-12-alkylene-OH, -COO(CH2CH2O)pH, -COO[CH2CH(CH3)O]pH, hydroxymethylphenyl, -CONH-C1-4-alkylene-OH or -COO-C1-4-alkylene-N(Q')(Q''), where p=2-4. The polymers according to the invention can be used, inter alia, for producing images, in particular for the construction of electrically conductive coatings or patterns.
申请公布号 JPS58103512(A) 申请公布日期 1983.06.20
申请号 JP19820208745 申请日期 1982.11.30
申请人 CIBA GEIGY AG 发明人 YURUGEN FUINTAA
分类号 G03F7/26;C08F8/00;C08F8/42;C08F20/00;C08F20/26;C08F220/30;C09D5/24;C09D133/04;G03F7/038;G03F7/30 主分类号 G03F7/26
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