SAMPLE TRANSFER APPARATUS

摘要

PURPOSE:To improve, in a sample transfer apparatus of electronic beam exposing system, pattern accuracy and throughput of drawing by driving a movable stage with a linear stepping motor. CONSTITUTION:Samples 2 such as a silicon wafer are placed on a movable stage 1 and these are provided within a vacuum chamber 3. Patterns are depicted on the sample 2 by the electron beam irradiated from an electronic optical mirror cylinder 4. The sample 2 can be moved through movement of movable stage 1 driven by the linear stepping motor 12 which is fixed to a surface plate 10 by supporting legs 11. When a current is applied to a drive coil 15 wound around a forcer 14, an absorbing force or a repulsive force is generated between the pole tooth 17 of the forcer and the pole tooth 16 of movable element. A movable element 13 is moved in the moving direction of movable stage 1 by sequentially changing the current direction and the sample 2 is moved by transferring such movement to the movable stage 1 by means of a coupling rod 9.