| 摘要 |
PURPOSE:To evaluate electrode resistance of micro-electrode for ohmic contact such as LSI by actually measuring a pair of basic pattern resistances and by accurately evaluating resistance of micro-electrodes from a difference between actual measurement and calculation. CONSTITUTION:1 is a first pattern, 2 is a second pattern, 3 is an operating layer in the width of W and length of L+2d, 4 and 5 are first electrode and second electrode in the width W and length d stacked at both sides of operating layer, 6 is a third electrode in the width W, length d formed at the location isolated by l1 from the first electrode and l2 from the second electrode. It is presumed that the metal material of the first to third electrodes 4, 5, 6 has a resistivity of zero ohm and thereby an intrinsic contact resistance rc is generated when the electrodes 4, 5, 6 and the operating layer 3 are placed in contact. In this case, a resistance between the first electrode 4 and third electrode 6 of the second pattern 2 and a resistance between the second electrode 5 and third electrode 6 are calculated and an intrinsic contact resistance rcOMEGAcm<2> resulting from such contact can be calculated therefrom. |
