发明名称 PATTERN FOR MEASURING LINE WIDTH
摘要 PURPOSE:To make the measured value more accurate by a method wherein a specified size of resist pattern is provided on a specified position adjoining a resist pattern for measurement. CONSTITUTION:The resist patterns L5 with line width exceeding two times of resistless pattern S4 for measurement are provided on both sides of the resistless pattern S4 for measurement while on both sides of resist pattern L4 for measurement, the resist patterns L5 with line width exceeding at least two times of said pattern L4 holding said resistless pattern S4 with line width similar to that of the pattern for measurement are provided outside said pattern L4. Through these procedures, the values more approximating to the line width inside circuit pattern may be measured making them more accurate.
申请公布号 JPS58101425(A) 申请公布日期 1983.06.16
申请号 JP19810199797 申请日期 1981.12.11
申请人 SUWA SEIKOSHA KK 发明人 SUDA HIDEKAZU
分类号 H01L21/30;G01B11/02;G03F1/38;G03F1/44;H01L21/027;H01L21/66 主分类号 H01L21/30
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