发明名称 SPUTTERING CATHODE AND SYSTEM FOR SPUTTER-COATING LARGE AREA SUBSTRATES
摘要 A system for sputter coating architectural glass is disclosed which includes an evacuable enclosure, a conveyor for moving glass to be coated along parallel paths, an elongated sputtering cathode supported between the paths, and structure by which ionizable gas is introduced into the enclosure. The cathode creates a continuous band of plasma extending about it through a region defining laterally spaced first and second sections extending generally parallel to glass on respective sides of the cathode and return sections joining the ends of the laterally spaced sections. The cathode includes sputtering material target face portions extending adjacent and parallel to the plasma sections and a magnetic field directing system for constraining the plasma flow in the sections to extend substantially uniformly over the target face portions.
申请公布号 DE2965330(D1) 申请公布日期 1983.06.09
申请号 DE19792965330 申请日期 1979.12.19
申请人 ADVANCED COATING TECHNOLOGY, INC. 发明人 CHAMBERS, DOUGLAS L.;WAN, B. CHONG TAK
分类号 C23C14/36;C23C14/35;C23C14/56;H01J37/34;H01L21/203;(IPC1-7):H01J37/34;C23C15/00 主分类号 C23C14/36
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