发明名称 VACUUM DEPOSITION FURNACE
摘要 PURPOSE:To make the responsiveness of the rate of evaporation fast and to prevent splashing by installing a heater which is a heating source in the upper part in a vacuum deposition furnace, and projecting carbon fins from the bottom plate of the furnace to above the bath surface. CONSTITUTION:When a shutter 4 is opened in the stage of vapor deposition, zinc vapor is plated through an opening 6 on a steel strip 10 which travels in, for example, a right direction, above the body 1 of the vapor deposition furnace. Here, molten zinc 7 is heated directly with the heater 8 in the upper part of the inside of the furnace or is heated with carbon fins 11, and evaporates successively from the surface layer. Therefore, the rate of evaporation responds quickly to the change in the rate of heating from the heater 8. Since the formation of the oxide film on the liquid surface of the zinc is suppressed by the reducing power of the carbon, splashing is difficult to arise and the sticking of liquid drops on the steel plate 10 is prevented.
申请公布号 JPS5896871(A) 申请公布日期 1983.06.09
申请号 JP19810193682 申请日期 1981.12.03
申请人 MITSUBISHI JUKOGYO KK 发明人 YANAGI KENICHI;TAGUCHI TOSHIO;HIRAZAKURA NAOYUKI
分类号 C23C14/24;C23C14/56 主分类号 C23C14/24
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