| 摘要 |
PURPOSE:To provide a vapor source device which permits vapor deposition of a uniform film thickness stably for a long time by separating a vapor source vessel to an area for supplying an evaporating material and an evaporating area with a constant temp. region and keeping the evaporating area unaffected by the disturbance of temp. in the melt. CONSTITUTION:In an evaporating vessel 1 for a vapor source having a long-axis direction in the direction intersecting orthogonally with the moving direction of a film, a plate material 7 consisting of an evaporating material is fed at a specified speed by means of nip rolls 8 between an area where a supply material 4 is melted to molten metal 2 by an electron beam 6 and the evaporating material is supplied along the long axis direction of said vessel, and an evaporating area where the evaporating material is evaporated by scanning a beam 5 over the width W, whereby a constant temp. region is constituted. Thus the disturbance of temp. in the melt in the evaporating area by discontinuous melting phenomena of the material is prevented and the stable vapor deposition is made continuous. |
