发明名称 HIGH-LUMINANCE ION SOURCE
摘要 PURPOSE:To reduce the restriction of ionized matters notably, and enable the abnormal reaction between a high-temperature emitter and an ionized matter to be completely prevented by inducing ion generation from a solid by means of electron beams of laser beams. CONSTITUTION:The pointed end of a pin-like emitter 6 is molten with beams 7, and an electric field is applied to the pointed end by means of a control electrode 2 and a lead-out electrode 3. As a result, ions begin to be discharged from the pointed end of the emitter 6. Ions discharged from the emitter 6, after being shaped by the beams of an ion optical-system 4, are irradiated upon a sample 5 which is to be subjected to a minute work. with a liquid metal ion source constituted of a high-temperature emitter, it is a practical limit to melt Au heated to around 1,200 deg.C. However, with electron or laser beams, the pointed end of the emitter 6 can be easily heated up to 2,000 deg.C-3,000 deg.C. Therefore, almost all matters including high-melting-point metals such as tantalum or hafnium can be molten.
申请公布号 JPS5887742(A) 申请公布日期 1983.05.25
申请号 JP19810186013 申请日期 1981.11.18
申请人 MITSUBISHI DENKI KK 发明人 KATOU TAKAAKI;ITAKURA HIDEAKI;KOYAMA HIROSHI
分类号 H01J27/26;H01J37/08;H01L21/027;H01L21/203;H01L21/265;H01L21/302 主分类号 H01J27/26
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