| 摘要 |
PURPOSE:To detect foreign matter in a reticle while the reticle is held set in the optical path for exposure by providing a means for generating laser light and an optical conducting means which conducts the laser light in the same direction as that of the exposure light in the optical path before the light for exposure enters a condenser lens. CONSTITUTION:A detector for foreign matter on the reticle of an exposure device is so constituted as to irradiate a reticle 5 having a pattern with the light condensed by condenser lenses 2, 4 and to form the pattern image on the photoresist coated on a wafer 8 or a mask. A means for generating laser light 20 is provided to this device, and an optical conductive means for introducing the laser light 20 in the same direction as exposure light is provided in the optical path before the light for exposure enters the lenses 2, 4. The foreign matter in the reticle 5 is detected while the reticle is held set in the optical path for exposure. |
