发明名称 SEMICONDUCTOR DEVICE FABRICATION METHOD
摘要 Semiconductor elements are fixed at a radiating plate. The slit, which is formed in the back side of the radiating plate of a cavity, is accepted in order to locate at a distributing part of the radiating plate. The resinoid is injected in the cavity and in the slit. After the resinoid is hardened, the semiconductor device is taken out from the cavity, and then the resinoid established in the slit is removed.
申请公布号 KR830000960(A) 申请公布日期 1983.05.14
申请号 KR19800001218 申请日期 1980.03.24
申请人 NIPPON ELECTRIC CO.,LTD. 发明人 OOHARA TAKESHI
分类号 H01L21/56;(IPC1-7):H01L21/56 主分类号 H01L21/56
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