发明名称 DETECTING DEVICE FOR SEMICONDUCTOR PRESSURE
摘要 <p>PURPOSE:To omit a resin film which covers the side surface of a pressure detecting element and to prevent the leakage even though pinholes are yielded in a resin film which covers an electrode, a wire, and a terminal. CONSTITUTION:A numeral 11 is a P type semiconductor diffused layer which is formed so as to surround a strain gage element 2 and to reach a P type semiconductor substrate 10. In the device constituted in this way, the P type strain gage element 2 is perfectly separated electrically by a P-N junction comprising the P type strain gage element 2 and an N type semiconductor layer and a P-N junction comprising the N type semiconductor layer 1 and a P type semiconductor substrate 10. Therefore, when the vicinity of the electrode 3, the wire 4, and the terminal 8 is filled with conductive material, the leakage current does not flow if the pinholes are not simultaneously yielded in the electrode 3, the wire 4, and the terminal 8, which have different potentials.</p>
申请公布号 JPS5878470(A) 申请公布日期 1983.05.12
申请号 JP19810177415 申请日期 1981.11.04
申请人 MITSUBISHI DENKI KK 发明人 BETSUSHIYO MIKIO
分类号 G01L9/04;G01L9/00;H01L29/84 主分类号 G01L9/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利