| 摘要 |
PURPOSE:To permit sharp etching of thin metallic layers in a short time without using any powerful etching soln. by providing >=1 layer of the vapor deposited metallic layers wherein the angles of vapor deposition with respect to a substrate increase gradually. CONSTITUTION:Vapor deposited metallic layers wherein angles theta of vapor depositon with respect to a substrate 1 incrase gradually are provided in >=1 layers on the substrate 1. Al is more preferable as the metal to be used, and the angle theta1 of initial vapor deposition is set at theta1<45 deg., and it is more preferable to set the angles in such a way that there is >=10 deg. in the changing range between said angle theta1 and the angle thetan of vapor deposition at the end of the vapor deposition. A photosensitive resin layer is provided on said vapor deposited metallic layers, and is patterned by pattern exposure and developing; thereafter, the vapor deposited metallic layers are etched by an aq. NaOH soln., etc. |
