发明名称 ELECTRON BEAM LITHOGRAPH CONTROLLING DEVICE
摘要 PURPOSE:To increase scanning speed to an optical system EOS from a reading control section RCU in a conventional technique by a method wherein a dot pattern conversion section DCVTs are multiplexed. CONSTITUTION:A control section CPU combined with a memory section MO for the cell information of a basic diagram and transfer sections DMA, DMAIF and having a memory section MM responds to interruption commands from a plurality of DCVTs consisting of a preprocessing section PPU, a function generating section FG, a writing control section WCU and supplies the DCVTs with the start address of the cell information in the MO in the order of lithograph. Based on this, the DCVTs store the dot pattern information for every cell memory M of the memory section CELMG through the memory section BC, the writing control bus WCUBUS. The reading control section RCU is provided with a bank table BT successively storing the M specified information given to the BCs of the DCVTs from the CPU and the BT is successively accessed and the pattern information is taken out from the M to convert in series and to supply to an EOS for lithograph. In this composition, scanning speed is faster than conventional one.
申请公布号 JPS5870532(A) 申请公布日期 1983.04.27
申请号 JP19810169328 申请日期 1981.10.22
申请人 TOSHIBA KIKAI KK 发明人 TOKITA MASAKAZU
分类号 H01L21/027;H01L21/30;(IPC1-7):01L21/30 主分类号 H01L21/027
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