发明名称 |
GALLIUM- UND/ODER INDIUMHALTIGE ZEOLITHE UND VERFAHREN ZU DEREN HERSTELLUNG SOWIE IHRE VERWENDUNG |
摘要 |
1. Gallium and/or indium-containing zeolites which a) have the following composition SiO2 : (0.20 +- 0.10) [Al2 O3 + M2 O3 ] : (0.15 +- 0.1) [Na2 O + K2 O] : (0.15 +- 0.14) R2 O expressed as molar ratio of oxides ; M being gallium and/or indium and R being tetramethylammonium, and b) have the characteristic X-ray diffraction pattern set forth below in Table 1 Interplanar Spacing Relative Intensity d (A) I/I0 11.50 +- 0.2 very strong 7.56 +- 0.1 weak to medium 6.62 +- 0.1 medium to strong 6.32 +- 0.1 weak 5.74 +- 0.1 weak 4.56 +- 0.1 medium 4.33 +- 0.1 medium to strong 3.76 +- 0.1 very strong 3.58 +- 0.1 medium to strong 3.31 +- 0.1 weak 3.15 +- 0.1 weak to medium 2.84 +- 0.1 strong to very strong 2.68 +- 0.1 weak to medium 2.48 +- 0.1 weak I0 = intensity of the strongest line or peak. |
申请公布号 |
DE3136686(A1) |
申请公布日期 |
1983.04.21 |
申请号 |
DE19813136686 |
申请日期 |
1981.09.16 |
申请人 |
HOECHST AG |
发明人 |
BALTES,HERBERT,DR.;INGO,DR. LEUPOLD,ERNST;LITTERER,HEINZ,DR.;WUNDER,FRIEDRICH,DR. |
分类号 |
B01J29/00;B01J29/04;C01B39/04;C01B39/06;C01G15/00;C07C1/00;C07C1/20;C07C11/02;C07C67/00 |
主分类号 |
B01J29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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