发明名称 COMPOSITE CONDUCTOR STRUCTURE FOR A SEMICONDUCTOR DEVICE
摘要 The compounds TiSi2 and TaSi2 have been found to be suitable substitutes for polysilicon layers in semiconductor integrated circuits. Suitable conducting properties of the compounds are ensured by providing a relatively thin substrate of polysilicon.
申请公布号 GB2038552(B) 申请公布日期 1983.04.13
申请号 GB19790042992 申请日期 1979.12.13
申请人 WE 发明人
分类号 H01B1/00;H01B1/06;H01L21/28;H01L21/3205;H01L21/768;H01L23/52;H01L23/532;H01L29/49;(IPC1-7):01L29/62 主分类号 H01B1/00
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