Electrophotographic photosensitive materials

摘要

The electrophotographic photosensitive material according to the invention has, on a conductive substrate, a photosensitive layer of amorphous silicon which contains hydrogen, the hydrogen content being less than 1 atom %. The 5 to 100 mu m thick layer is applied to the heated substrate in a controlled atmosphere, optionally in the form of several layers having different conduction properties. The layer has good spectral sensitivity in the range above 700 mu m, good stability, heat resistance and strength during printing. The material is therefore particularly suitable for copiers and printers operating at high speed.