发明名称 Method for producing mixed crystal wafer using special temperature control for preliminary gradient and constant layer deposition suitable for fabricating light-emitting diode
摘要 A method of manufacturing a mixed crystal compound semiconductor wafer suitable for the production of LED having a high light output. Upon a monocrystalline substrate of III-V semiconductor material a base layer is epitaxially grown of the same material as the substrate. An initial gradient layer is grown on the base layer having a mixed crystal ratio varying continuously from that of the base layer to a first value at a constant temperature. A combination sublayer is grown on the initial gradient sublayer which includes at least one constant sublayer having a constant crystal mixture ratio and at least one gradient sublayer having a crystal mixture ratio varying continuously between the mixed crystal ratios of its adjacent constant layers.
申请公布号 US4378259(A) 申请公布日期 1983.03.29
申请号 US19800219722 申请日期 1980.12.24
申请人 MITSUBISHI MONSANTO CHEMICAL CO. 发明人 HASEGAWA, SHINICHI;FUJITA, HISANORI
分类号 H01L21/205;H01L29/205;H01L33/30;H01L33/34;(IPC1-7):H01L21/20;H01L21/32 主分类号 H01L21/205
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