| 摘要 |
PURPOSE:To obtain a correction soln. for use in an electrophotographic offset master plate superior in printing resistance of an erased part, by using the soln. contg. a polymer consisting of (meth) acrylic acid, maleic acid, or itaconic acid monomer units, and aliphatic carboxylic acid, and aliphatic alcohol. CONSTITUTION:A correction soln. contains (A) 0.2-30wt% polymer consisting mainly of monomer units of at least one of acrylic acid, methacrylic acid, maleic acid, and itaconic acid; (B) 0.2-30wt% aliphatic carboxylic acid; (C) 40- 95wt% aliphatic alcohol; (D) 1-50wt% water; and when needed, (E) 0.1-20wt% fluorine-contg. surfactant as main components. The component (A) is preferably in 10,000-500,000mol.wt. range, and in the case of copolymer, the content of monomer units of at least one of said acids is preferably >=50mol% of the total monomer units. |
