发明名称 |
DOT-ENLARGEMENT PROCESS FOR PHOTOPOLYMER LITHO MASKS |
摘要 |
<p>An imaged element containing a polymeric relief or stencil image, in which the polymer contains crosslinkable moieties, is subjected to an image enlargement process by contacting the image with a solution containing a swelling agent for the image, and a crosslinking agent. The process is particularly useful in enlarging the half-tone image dot area of photopolymer litho masks wherein the half-tone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.</p> |
申请公布号 |
EP0052806(A3) |
申请公布日期 |
1983.03.16 |
申请号 |
EP19810109296 |
申请日期 |
1981.10.29 |
申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
HEIART, ROBERT BERNARD;O'NEIL, JAMES WILLIAM |
分类号 |
G03F7/26;G03F1/56;G03F7/40;(IPC1-7):03F1/00;03F5/00;03C5/00;03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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