MONITORING A GAS PLASMA ETCHING PROCESS,申请号GB19800016838-传众专利搜索

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发明名称	MONITORING A GAS PLASMA ETCHING PROCESS
摘要
申请公布号	GB2050952(B)	申请公布日期	1983.02.23
申请号	GB19800016838	申请日期	1980.05.21
申请人	HITACHI LTD	发明人
分类号	C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):C23F1/00	主分类号	C23F4/00
代理机构		代理人
主权项
地址

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