| 摘要 |
PURPOSE:To obtain a photoreceptor excellent in resistance to heat, moisture, optical fatigue, and corona ions, stabilized in electrophotographic characteristics, and not causing deteriorated development, by providing a substrate, a barrier layer, and a photoconductive layer consisting of an amrophous silicon. CONSTITUTION:A photoconductive layer 3 made of an amorphous silicon (a-Si) is formed on a conductive substrate 2, for example, by the glow discharging method. Besides, between the layers 3 and the substrate 2 a barrier layer for inhibiting injection of carriers from the side of the substrate 2 is provided. For the material for forming this barrier layer, for example, Au, Ir, Rd, Pd, Mo, etc. are used. |
