发明名称 PROCESS FOR THE DEPOSITION OF THICK CHROMIUM FILMS FROM TRIVALENT CHROMIUM PLATING SOLUTIONS
摘要 <p>A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.</p>
申请公布号 CA1141328(A) 申请公布日期 1983.02.15
申请号 CA19800349997 申请日期 1980.04.16
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 VIGAR, JAMES M.L.
分类号 C25D3/06;(IPC1-7):25D3/06 主分类号 C25D3/06
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