发明名称 Ion implantation for hard bubble suppression
摘要 A method for processing a magnetic bubble domain device for hard bubble suppression comprising the steps of providing a non-magnetic substrate; providing a thin layer of magnetic material capable of supporting magnetic bubble domains on a first major surface of the substrate; and directing a beam of ions consisting essentially of a nongaseous ion at the substrate.
申请公布号 US4372985(A) 申请公布日期 1983.02.08
申请号 US19800213976 申请日期 1980.12.08
申请人 ROCKWELL INTERNATIONAL CORPORATION 发明人 BAILEY, ROBERT F.
分类号 C23C14/48;H01F41/14;H01F41/18;(IPC1-7):B05D3/06 主分类号 C23C14/48
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