发明名称 Layered amorphous silicon electrophotographic photosensitive member comprises BN surface layer and BN barrier layer
摘要 An electrophotographic photosensitive member wherein a photoconductive layer prepared from amorphous silicon is interposed between a barrier layer and surface layer, both prepared from boron nitride, and which is characterized in that it has a high specific resistivity, and, when applied as a barrier layer, indicates a high charge retention capability, strains in said barrier layer are reduced, the surface layer absorbs very little light and allows for the permeation of the greater part of the incoming light rays, thus preventing the photosensitivity of a photoconductive layer and the residual potential from being deteriorated, and since the concentration of boron varies in the boundary of the respective layer across their thickness, the photoconductive property can be sustained and the exfoliation of the layers can be avoided.
申请公布号 US4729937(A) 申请公布日期 1988.03.08
申请号 US19860943190 申请日期 1986.12.18
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAMAZAKI, MUTSUKI
分类号 G03G5/082;G03G5/14;G03G5/147;(IPC1-7):G03G5/14 主分类号 G03G5/082
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