| 摘要 |
PURPOSE:To enable the resistance value, e.g. of a resistance thin film formed to be made constant independently of the no. of uses of a target and a position in a sputtering face by applying one of the exposed faces of a laminate, as a sputtering face, formed by superposing two or more kinds of different sheets. CONSTITUTION:Sheets 1 of resistance material such as Ta and sheets 2 of insulating material such as SiO2 are alternately superposed to a height B. Sheets 1,2 are equal in length a and width H, and different in thickness D1, D2. The resistance value is set according to the ratio of areas which are occupied by sheets 1, 2 in sputtering face 3, respectively, that is, the ratio of the total area of the resistance materials sheets=AXD1Xthe no. of the sheets and the total area of the insulating material sheets=AXD2Xthe no. of the sheets. In order to change this ratio to obtain a desired resistance value, the thickness D1, D2 of the no. of the sheets is varied. When reduction ratio is different after repeated uses, this laminate can be disjointed to exchange consumed sheets, and hence the properties of the resulting thin film can be made uniform. |
