发明名称 POSITION DETECTING METHOD OF CIRCULAR MASK SUBSTRATE
摘要 PURPOSE:To detect a position of a mask substrate easily and at a low cost, by providing a recessed part on the reverse side of the circular mask substrate, supplying gas to a nozzle pipe placed on the reverse side of the substrate, moving the substrate, and detecting a variation of gas pressure of a gas pipe. CONSTITUTION:On the peripheral part of a discoidal glass substrate 1 forming a mask pattern, >=2 recessed parts 2 are provided. On the other hand, on the reverse side of the substrate, a nozzle 3 made of stainless steel, for jetting highly pressurized gas is provided, so that the recessed part 2 and the nozzle 3 conform with each other when the glass substrate 1 has been rotated and moved by use of a fine movement gase 4 which finely moves in the directions X, Y. Highly pressurized gaseous nitrogen supplied to a gas reservoir from a feed pipe 6 is fed to the nozzle 3, and it is detected that a value of a pressure gauge provided to an exhaust pipe 7 is varied at the time point when the tip of the nozzle 3 has conformed with the recessed part 2. Accordingly, a position of the mask substrate 1 is detected easily and at a low cost.
申请公布号 JPS58706(A) 申请公布日期 1983.01.05
申请号 JP19810099442 申请日期 1981.06.25
申请人 FUJITSU KK 发明人 MATSUI SHIYOUGO
分类号 G01B13/00;(IPC1-7):01B13/00 主分类号 G01B13/00
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