| 摘要 |
PURPOSE:To form a uniform thin film on the surface of a columnar substrate at a high rate by supplying a microwave to the conductor arranged in the immediate proximity of the outer surface of the substrate when the substrate is placed in a vacuum chamber, raw gas is supplied, excited, and decomposed by a microwave, and a thin film is formed on the substrate surface. CONSTITUTION:The substrate 2 having a three-dimensional shape such as a column is arranged in the vacuum chamber 1, and the conductor 5 is set in the proximity of the outside. A microwave oscillator 3 is connected to a microwave transmission line consisting of a coaxial cable or a coaxial tube, the center transmission line 4' is connected to the conductor 5, and the outer transmission line 4'' is connected to the substrate 2. The substrate 2 is heated by a heater 8, the raw gas contg. an Si compd. such as SiH4 is supplied into the vacuum chamber 1 from a gas inlet 6, and a microwave is transmitted to the substrate 2 and the conductor 5 from the microwave oscillator 3. A strong electric field is generated between the conductor 5 and the substrate 2 to excite and decompose the raw gas and to produce the plasma, hence a uniform thin amorphous Si film is formed on the substrate 2, and an electrophotographic sensitive body is obtained at a low cost. |
