| 摘要 |
PURPOSE:To control temperature distribution in a furnace accurately, by a method wherein a horizontal furnace is employed and a shutter mechanism is installed in an opening of a section for pre-heating and slow cooling in the furnace. CONSTITUTION:A horizontal furnace 4 is divided into a furnace section 4a which pre-heats a substrate 8 and cools it slowly and a furnace section 4b which makes a liquid epitaxial film grow. A shutter mechanism 1a is installed in an opening of the furnace section 4a for pre-heating and slow cooling. A holder 7 to hold the the substrate 8 is supported by a support shaft 6 and moved in the furnace sections 4a, 4b by moving the shaft 6 in the axial direction. The shaft 6 moves the substance 8 in the furnace section 4a and the substance 8 is pre-heated after closing the shutter. Then, the shaft 6 moves the substrate 8 in the furnace section 4b where the substrate 8 is immersed within a solution 2 in a pot 3 and rotated along a circular arc thereby a liquid epitaxial film is grown on the substrate 8. |
