| 摘要 |
PURPOSE:To inexpensively form a large number of glass photomasks free from pinholes and having high pattern accuracy by forming an electroless plated multilayer film on an oxide film laid on each substrate and carrying out patterning. CONSTITUTION:An oxide film of >=1 kind of oxide selected from SnO2, In2O3, Sb3O5, TiO2, Ta2O5, Nb2O5, SiO2, GeO2 and ZrO2 is laid on each transparent insulator substrate, and an electroless plated film is formed on the oxide film and calcined. Electroless plated films are further formed to form an electroless plated multilayer film free from pinholes and having superior adhesive strength. Patterning in the desired shape and design is then carried out. By this method a glass photomask free from >=2mum pinholes and having an accurate pattern is obtd. inexpensively. |
