发明名称 |
Electron beam exposure system. |
摘要 |
<p>An electron beam exposure system of a variable shaped electron beam type in which an input pattern of any geometrical shape is decomposed into rectangular patterns of a given size, whereby the pattern is exposed by an electron beam having a cross-section corresponding to the decomposed rectangular pattern. Data for the input pattern is compared with data for the rectangular cross-sectional pattern of the electron beam in a comparator (3). When the comparison results is that the input pattern should be decomposed into rectangular patterns, the former is decomposed into two sub-patterns, one of which is outputted while the other again undergoes the comparison with the rectangular pattern parameters. The processing of decomposition can be executed at a very high speed in a pipelined system (Fig. 7) which includes a plurality of processing stages of similar arrangement.</p> |
申请公布号 |
EP0066882(A2) |
申请公布日期 |
1982.12.15 |
申请号 |
EP19820105022 |
申请日期 |
1982.06.08 |
申请人 |
HITACHI, LTD.;NIPPON TELEGRAPH AND TELEPHONE PUBLIC CORPORATION |
发明人 |
SHIBAYAMA, AKINORI;FUJINAMI, MINPEI;YODA, HARUO |
分类号 |
H01L21/027;H01J37/302;H01L21/30;(IPC1-7):01J37/302 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|