发明名称 3,5-Disubstituted phthalic acid imides, phthalic acids and phthalic acid anhydrides
摘要 Novel compounds of the formula I or II <IMAGE> are described, in which M1 and M2 individually are -OH or together are -O-, R is hydrogen, C1-20-alkyl, C2-5-alkenyl, C3-5-alkynyl, C5-12-cycloalkyl, benzyl, phenyl or toluyl, X is -NO2, -OR', -SR' or -SO2R' and the (R')s independently of one another are C1-20-alkyl, C3-5-alkenyl, C3-5-alkynyl, C2-4-monohydroxyalkyl, C1-12-halogenoalkyl, benzyl, C5-12-cycloalkyl, phenyl, carboxyphenyl, halogenophenyl, nitrophenyl, alkyl- or alkoxy-phenyl each having 1-4 C atoms in the alkyl or alkoxy moieties, or acetylaminophenyl. The compounds (I) and compounds (II) in which M1 and M2 together are -O- are suitable as sensitizers for photocrosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.
申请公布号 US4363917(A) 申请公布日期 1982.12.14
申请号 US19810258268 申请日期 1981.04.28
申请人 CIBA-GEIGY CORPORATION 发明人 FISCHER, WALTER;KVITA, VRATISLAV;ZWEIFEL, HANS
分类号 C07C67/00;C07C313/00;C07C323/62;C07C323/65;C07C323/66;C07D209/48;C07D307/89;C07D335/16;C08F2/00;C08F2/48;C08F2/50;C08F4/00;C08F4/32;C08F10/00;C08J3/24;C08J3/28;C08K5/37;G03F7/031;G03F7/038;(IPC1-7):C07D209/48 主分类号 C07C67/00
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