发明名称 |
Dense vertical FET and method of making. |
摘要 |
<p>A dielectrically isolated region (16) of a mono-crystalline substrate (10), which has a <100> orientation, has a drain region of a field effect transistor (FET) in a surface having a (100) crystal orientation with the drain region being of opposite conductivity to the conductivity of the substrate (10). A gate channel extends into the substrate (10) from the drain region and is surrounded at its upper end by the drain region. An enlarged recess (37) extends into the substrate (10) beneath the gate channel and has its walls (38) of opposite conductivity to the conductivity of the substrate (10) to form a source region and a plate of a capacitor when the FET is part of a storage cell. The source region has its upper end surrounded by the gate channel.</p> |
申请公布号 |
EP0066081(A2) |
申请公布日期 |
1982.12.08 |
申请号 |
EP19820103545 |
申请日期 |
1982.04.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FATULA, JOSEPH JOHN, JR.;GARBARINO, PAUL LOUIS;SHEPARD, JOSEPH FRANCIS |
分类号 |
H01L21/762;H01L27/10;H01L21/306;H01L21/336;H01L21/822;H01L21/8242;H01L27/04;H01L27/108;H01L29/78;(IPC1-7):01L21/76;01L21/28;01L29/78;01L27/08 |
主分类号 |
H01L21/762 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|