| 摘要 |
PURPOSE:To monitor highly precisely the thickness of a dielectric thin film, by providing independently a plurality of shutters so that vapor deposition particles fly independently to a monitor base plate and to a sample base plate. CONSTITUTION:The shutters 12, 13 are positioned such that the deposition stream from a deposition source 5 would reach the transparent monitor base plate 2, but would not reach the sample base plate 4. The transmittance and the reflected light from the transparent monitor base plate 2 are measured by light detectors 9, 10 so that the formation of an optical thin film on the transparent monitor plate 2 is monitored. When their values reach prescribed values, the shutters 12, 13 are moved to positions so that the deposition stream can reach the sample base plate 4. |
