发明名称 METHOD OF MEASURING LENGTH OF CIRCUIT PATTERN IN SEMICONDUCTOR WAFER USING SCANNING TYPE ELECTRON MICROSCOPE AND APPARATUS THEREFOR
摘要 PURPOSE:To measure length automatically and accurately, by a method wherein image of circuit pattern is displayed on a screen of a Braun tube, a marker is moved to corresponding portion between two points, and electric signal for generating the marker or the like is used. CONSTITUTION:Image of a circuit pattern is displayed on a screen 5a of a Btaun tube 5 using a scanning type electron microscope. On the screen 5a, a marker MK displayed by brightness modulation is moved to corresponding portion between two points in the circuit pattern image. Length between required two points in the circuit pattern is measured by electric signal for generating the marker MK and electric signal corresponding to the image between two points.
申请公布号 JPS57199230(A) 申请公布日期 1982.12.07
申请号 JP19810084119 申请日期 1981.06.01
申请人 AKASHI SEISAKUSHO:KK 发明人 SATOMURA SEIICHIROU;YANAI HIDEAKI;MIYAZAWA MITSUHISA
分类号 H01J37/28;H01L21/66 主分类号 H01J37/28
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