| 摘要 |
PURPOSE:To simultaneously clean the reaction tube for the production of semiconductor devices, etc., and a material to be cleaned by providing a supporting rod for hanging the material on the inner wall of a rotary cylinder, and furnishing a funneled liq. receiver for dropping a liq., which has been injected from an injection nozzle, into the reaction tube. CONSTITUTION:The supporting rod 12 for hanging a material 2 (e.g., heat- treating jig) to be cleaned is provided on the inner wall of the rotary cylinder 3 for rotating the reaction tube 1 to be used in the formation of the film of a semiconductor water. The funneled lig. receiver 11 for receiving a liq., which has been injected onto the material 2 from the injection nozzle 5, and dropping the liq. through the inside of the reaction tube 1 is circumferentially furnished. In such a constitution, the reaction tube 1 is held in the rotary cylinder 3 through a fixing band 4, etc., and the material 2 is hung from the supporting rod 12. The cylinder 3 is then rotated in the direction A to rotate the reaction tube 1 and material 2 in the direction A. The nozzle 5 is vertically moved, a soln. of hydrofluoric acid, etc., pure water, and gaseous nitrogen are successively injected onto the surface of the material 2 and the inner wall of the reaction tube 1, and both materials are cleaned at the same time. |
