摘要 |
PURPOSE:To increase vertical coercive force even when a film is thin, by providing a Co thin film over a substrate. CONSTITUTION:Over a substrate 1, a Co magnetic thin film 2 is formed by vapor deposition, ion plating, or sputtering to >=500 angstrom thickness. Over the film, a Co-Cr vertically magnetized film 3 which contains 10-20wt% Cr is formed by vapor deposition, ion plating, or sputtering to 500-5,000 angstrom thickness. |