发明名称 Solid-state imaging device
摘要 In a solid-state imaging device having a plurality of photosensitive portions and a semiconductor substrate which includes at least scanning means for scanning the photosensitive portions, the photosensitive portions including a layer of a photosensitive material overlying the semiconductor substrate and a transparent electrically conductive film overlying the photosensitive material layer; a solid-state imaging device characterized in that the photosensitive material is an amorphous material whose indispensable constituent is silicon and which contains hydrogen. The hydrogen content of the photosensitive material is preferably 5 atomic-% to 30 atomic-%, especially 10 atomic-% to 25 atomic-%.
申请公布号 US4360821(A) 申请公布日期 1982.11.23
申请号 US19790066230 申请日期 1979.08.13
申请人 HITACHI, LTD. 发明人 TSUKADA, TOSHIHISA;MARUYAMA, EIICHI;BAJI, TORU;ATAKA, SABURO;IMAMURA, YOSHINORI;SASANO, AKIRA;KUBO, MASAHARU;KOIKE, NORIO;NAGAHARA, SHUSAKU
分类号 H01L27/146;(IPC1-7):H01L27/14 主分类号 H01L27/146
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