发明名称 ELECTRON BEAM EXPOSURE DEVICE
摘要 PURPOSE:To contrive the improvement of workability and quality, by equipping a thermosensor and heating device in a reserve chamber of electron beam exposure with a sensor and controller for heating provided in the outside of the chamber. CONSTITUTION:A cassette 1 with a wafer or mask 7 suppressed 8 by a reference surface 13 built-in is settled in the reserve chamber 3 via a retaining device 2. When the chamber 3 is evacuated by a pump 4, the adiabatic expansion of gas decreases the temperature in the chamber followed by the decrease of the temperature of the cassette 1 and retaining device 2. This is detected by the sensor 5 for control 9 with the heating device 6 built in a retainer 2 control-driven 10. Therefore, the cassette 1 can be recovered to a fixed temperature in a short time and maintained so that the work is accelerated without strain due to the temperature recovery of th cassette 1 and mask or wafer 7 during exposure to improve the quality.
申请公布号 JPS57190318(A) 申请公布日期 1982.11.22
申请号 JP19810075390 申请日期 1981.05.19
申请人 TOSHIBA KIKAI KK 发明人 NINOMIYA MASAHARU
分类号 G03F7/20;H01J37/317;H01L21/027 主分类号 G03F7/20
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