发明名称 |
Process control system |
摘要 |
This invention relates to a process control system and method of controlling a chemical vapor deposition (CVD) process where a coating is deposited on a substrate heated by passing a current through the substrate to create a heating zone. The control system relies on detecting a signal induced on the coated substrate outside of the heating zone and using the induced signal to control one or more process parameters.
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申请公布号 |
US4358473(A) |
申请公布日期 |
1982.11.09 |
申请号 |
US19810266435 |
申请日期 |
1981.05.22 |
申请人 |
AVCO CORPORATION |
发明人 |
DEBOLT, HAROLD E.;MORRISSEY, JOSEPH;SUPLINSKAS, RAYMOND J. |
分类号 |
C23C16/52;(IPC1-7):B05D5/00 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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