| 摘要 |
PURPOSE:To obtain the titled lithographic plate free from uneven coating and having a uniform film thickness by dissolving a photosensitive composition contg. a surfactant contg. fluorine in a specified solvent, coating a support with the soln., and drying the coated support. CONSTITUTION:A photosensitive composition is prepared by mixing 10-50wt% quinone diazide type positive photosensitive substance such as the ester of naphthoquinone-1,2-diazido-2-sulfonic acid chloride and phenol-formaldehyde resin with 40-80wt% binder such as phenol-formaldehyde resin and 0.005- 0.05wt% surfactant contg. fluorine represented by the formula (where Rf is partially or perfectly fluorinated alkyl; A is 0, 1-6C carbonyl, sulfonyl, amino or alkylene; and Y is a nonionic group, an anionic group, a cathionic group or betaine). The composition is dissolved in a solvent with >=8[Cal/cm<3>]<1/2> solubility parameter and 100-200 deg.C b.p. such as ''ethyl cellosolve ''. A support is coated with the soln., and the coated support is dried at 20-150 deg.C. |
