| 摘要 |
PURPOSE:To reduce the displaced width of patterns in a semiconductor device by superposing the second positioning pattern made of linear lines connecting vertexes of a rectangle on the first positioning pattern made of linear lines connecting the vertexes of a rectangle having congruent figure to the second pattern and reverse gradient. CONSTITUTION:The vertexes A', D' of a rectangle C' D' B' A' are connected to the first positioning pattern made of linear lines for connecting the vertexes B, C of a rectangle ABCD having congruent figure to the rectangle C' D' B' A', the second positioning pattern made of linear lines is superposed so that the gradient becomes reverse to put A' to A, B' to B..., D' to D, and the point and angle for dividing the linear lines into two equal segments are represented by O, O', theta deg.. There is a relationship of l/d=1/2costheta. When the condition of l/d>1 is satisfied, the displacement d is enlarged to l. In this manner, even if the positioning patterns are small, the positioning can be accurately improved corresponding to the amount to be enlarged. |
